Uniform heating wafer dryer

Tue, 09 Jun 2026 01:30:44 +0800

The wafer hits the spin track, and the clock starts ticking. On the line, a minute of temperature drift is enough to move your critical dimension, and one particle can kill the whole lot. The old dryers never quite kept uniformity across the full 300 mm while staying clean. We built the Uniform Heating Wafer Dryer to take that variability off the table. What matters under the hood Inside, short-wave infrared emitters sit in a reflector-optimized chamber to hit wafer-level thermal uniformity of ±0.1°C across 300 mm, backed by a calibrated 9-point map. Temperature ramps exceed 10°C/s with controlled overshoot, so your thermal budget lines up with soft bake and hard bake recipes without over-curing photoresist. It’s cleanroom-native: Class 1–100 operation, HEPA-integrated airflow, exhaust filtration, and low-outgassing materials that keep particle generation at zero during the cycle. The control loop is PID with 0.05°C setpoint resolution, and you can store a recipe per process. That repeatability keeps CD and profile in spec, shift after shift. Why it plays on the litho floor In lithography, your bake profile has to be the same at 02:00 as it is at 14:00. This dryer holds setpoint stability under load, so line-of-sight uniformity translates to consistent photoresist adhesion and predictable edge bead removal. The ramp is fast and controlled, which cuts cycle time without sacrificing yield, and the low-particle design keeps defects off the wafer—fewer reworks, fewer scrapped lots. The emitter array runs efficiently, and smart standby modes trim energy use. Reliability comes from running 24/7 with scheduled maintenance, not surprise downtime. What you need to plan for Installation means a dedicated exhaust port and cleanroom-grade power conditioning—keeps emitter life healthy and control stability tight. The chamber is optimized for 150 mm and 300 mm wafers, so make sure your carriers and interfaces match the automation handoff. Plan a 48-hour qualification run to map temperature, particle count, and ramp behavior against your specific photoresist stack. Once you nail that alignment, the process stays in control.

Uniform on Eco-Friendly Warm IR Heaters

Uniform heating wafer dryer