TEL (Tokyo Electron) heater lamp

Wed, 17 Jun 2026 12:02:47 +0800

Out on the fab floor, a 0.5°C drift during the photoresist bake is all it takes to scrap a whole lot. You need heat you can bank on, not a guess. We built a TEL-compatible heater lamp that drops in clean and runs like it belongs, with repeatable temperature control when your process window is measured in nanometers. What’s under the hood We run short-wave infrared elements and high-purity quartz assemblies, so you get fast response without adding noise to the process. Across the bake surface, wafer-level uniformity holds within ±0.1°C—good for soft bake and hard bake profiles that run on tight thermal budgets. The output stays stable over 5,000+ hours, with less than 5% intensity drop. It works off standard voltage configurations, fits common lamp modules, and keeps particle performance in line with Class 1–100 cleanroom requirements. Why it matters in lithography In lithography, bake temperature is what drives CD control and defect density. This lamp locks the thermal profile lot-to-lot, which cuts rework and keeps yield out of the gutter. Efficiency comes from tight infrared coupling and low standby losses, and the long life trims spare inventory and maintenance windows. The payoff is predictable runs, fewer line stops, and photoresist behavior you can count on. What you need to do right Installation means matching the mechanical envelope and connector pinout on the host lamp module, then aligning the optical path to the original tolerance so uniformity doesn’t slip. The lamp is a validated equivalent for specified TEL platforms, but before you swap it in, confirm chamber geometry and control firmware so compatibility checks out end-to-end.

(Tokyo on Eco-Friendly Warm IR Heaters

TEL (Tokyo Electron) heater lamp